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Associate Professor

謝昌志 專案專業技術人員(副教授級)

謝昌志

Email

changjyh@must.edu.tw

Tel

+886-3-5593142 # 1366

Education

Doctoral Program of Institute of Chemical Engineering, College of Engineering, National Tsing Hua University


Experience

[Industry experience]
1. Manager, Mask & R&D Department, Taiwan Semiconductor Manufacturing Company TSMC 2002~2019
2. UMC R&D Department, UMC, Chief Engineer 1997~2002
3. Senior Engineer, Winbond R&D Department, Winbond Electronics Company, 1996~1997
[Teaching experience]
1. Mingxin University of Science and Technology, Department of Semiconductor and Optoelectronics Technology, Associate Professor 2023.8~present
2. Assistant Professor, Department of Semiconductor and Optoelectronics Technology, Mingxin University of Science and Technology 2023.2~2023.7
3. Mingxin University of Science and Technology, School of Semiconductors, Part-time Assistant Professor 2021.2~2023.1
4. Department of Chemical Engineering, National Tsinghua University, Part-time Assistant Professor 2021.8~2023.1


Research Interest

Lithography and photomask manufacturing technology, semiconductor huge data processing and application, overall solution technology for semiconductor yield improvement


Patent

  1.  
  2.     

USA

  1. 1.Multiple-patterning photolithographic mask and method,” US9513552, 2016 Dec., 2015-2035.
  2. 2.Multiple-patterning photolithographic mask and method,” US8986911, 2015 Mar., 2012-2032.
  3. 3.Lithography performance check methods and apparatus,” US8650511, 2014 Feb., 2010-2030.
  4. 4.Optical proximity correction method,” US7297450, 2007 Nov., 2006-2026.
  5. 5.Optical proximity correction method,” US7063923, 2006 Jun., 2004-2024.
  6. 6.Correcting the polygon feature pattern with an optical proximity correction method,” US6767679, 2004 Jul., 2002-2022.
  7. 7.Optical mask correction method,” US6638664, 2003 Oct., 2001-2021.
  8. 8.Ionic conducting polymer electrolytes based on a side-chain liquid crystalline polymer,” US5091274, 1992 Feb., 1991-2011.

 

ROC

  1. 9.An Optical Proximity Correction Method,” ROC, TWI290338, 2007 Nov. 2007-2022.
  2. 10.Correcting the Polygon Feature Pattern with an Optical Proximity Correction Method,” ROC, TWI244678, 2005 Dec., 2005-2021.
  3. 11.Method Of Correcting Optical Proximity Effects,” ROC, TWI230877, 2005 Apr. 2005-2021.
  4. 12.Correction method of photomask pattern,” ROC, TW485271, 2002 Aug., 2002-2021.
  5. 13.Ionic conducting polymer electrolytes based on a side-chain liquid crystalline polymer,” ROC, TWI66831, 1991 Dec., 1991-2011.

 

China

  1. 14.Method for modifying characteristic pattern of regular polygon mask by use optical proximity effect,” China, CN1285967, 2006 Nov., 2002-2022.
  2. 15.Optical approaching correcting method,” China, CN1225678, 2005 Nov., 2002-2022.
  3. 16.Mask-pattern correction method,” China, CN1190708, 2005 Feb., 2002-2022.


Journal

 

Conference

Courses

 

Introduction to semiconductor industry ,  semiconductor manufacturing technology ,  nanomaterials

Images

謝昌志_研討會
謝昌志_專利
謝昌志_期刊
Year Type Title
2023 民間企業產學計畫案（私人企業或法人機構之案件） 黃光微影製程能力優化計畫
Year Title
2024 112學年度第2學期大師講座(介紹區塊鏈的過去、現在與未來，以及區塊鏈對在座同仁將產生哪些影響)
2023 111學年度第二學期全校教師教學暨輔導知能精進研討會
2023 112-1全校教師輔導知能研習-校園性別事件樣貌與案例分享-以師生案之處理為核心
2023 全校教師教學暨輔導知能精進研討會-淨零轉型下綠色永續科技發展趨勢
2023 全校教師教學暨輔導知能精進研討會-私校退撫儲金-您的基本權益
2023 產學合作經驗分享及教師進行產業研習或研究說明