| 2105 |
effects of Anneal temperature on Properties of Indium-Zinc Oxide Films Prepared by Radio Frequency Sputtering |
| 2023 |
The comparison of ZrO2/SiO2 and Y-doped ZrO2/ SiO2 double stack pH sensing membrane annealed in O2 and N2 ambient |
| 2023 |
LED光源模組量測 |
| 2023 |
The influence of deposition power and annealing temperature on the characteristics of indium zinc oxide films deposited by RF magnetron sputtering |
| 2023 |
Design and Implementation of Black Coating Using ITO-Free Electrochromic Film |
| 2023 |
The Effect of Oxygen-Plasma Treatment on the Optical and Surface Properties of Polydimethylsiloxane Layers |
| 2022 |
LED 顯示器驅動 IC 時序控制研究 |
| 2021 |
ITO透明導電薄膜之製作與特性研究 |
| 2021 |
Investigation of Oxygen Plasma Treatment Prior TEOS Oxide Gate Dielectrics on Electrical and Hysteresis Characteristics of Top-Gate a-IGZO Thin-Film Transistors |
| 2021 |
The PZT Sensing Membrane Applied in Electrolyte–Insulator-Semiconductor Structure |
| 2020 |
Optical properties of ITO/ Nb doping TiO2 double layer thin films deposited by sputtering |
| 2020 |
Optical and Mechanical Properties of Sputtered Molybdenum Thin Films from 5 nm to 50 nm |
| 2019 |
Effects of deposition power and annealing temperature of Ti1-xNbxO2 transparent conductive films |
| 2018 |
Studies of the characteristics of double layers transparent conductive oxide ITO/TNO thickness combination |
| 2018 |
Optical properties of Ti1-xNbxO2 films prepared by reactive magnetron co-sputtering of Ti and Nb targets |
| 2017 |
Positive Bias Stress Instability of In-Ga-Zn-O Thin-Film Transistors with Al2O3/TEOS Oxide Gate Dielectrics |
| 2017 |
Optical Simulation of Transparent Conductive Films with IWO/NTO Anti-reflection Coating for Silicon Solar Cells |
| 2016 |
Effects of oxygen flows and annealing temperature on properties of cosputtering In2O3-Ga2O3-Zn thin films |
| 2016 |
Investigation of annealing temperature on cosputtering In2O3-Ga2O3-Zn thin films prepared with high/low oxygen flows |
| 2015 |
Effects of Oxygen flows and annealing temperature on properties of Co-sputtering In2O3-Ga2O3-Zn thin Films |
| 2015 |
Effects of annealing temperature on optical properties and residual stress of IGO and IGZO films |
| 2015 |
Effect of Deposition Power on the properties of IZO films and it’s applications on Source-Drain Electrodes of a-IGZO TFTs |
| 2014 |
Effects on Deposition Power on Properties of Indium-Zinc Oxide Films by Radio Frequency Sputtering |
| 2014 |
Effects of O2 flow s on the properties of Co -sputtering sp |
| 2013 |
Characteristics of Indium-Zinc Oxide Films Prepared by Radio Frequency Magnetron Sputtering |
| 2013 |
Electrical and optical properties of indium-gallium-zinc oxide films prepared by triple targets cosputtering using varying deposition power |
| 2013 |
Electrical and optical properties of indium-aluminum-zinc oxide semiconductor films prepared by triple target co-sputtering using varying deposition power |
| 2013 |
Electronic Structure and Optical Properties of In-doped ZnO with Intrinsic Defects from First principles Calculations |
| 20121123 |
以射頻與直流磁控濺鍍銦錫氧化物電極之In-Ga-Zn-O薄膜電晶體之特性研究 |
| 2012 |
Electrical Characteristics of a-IGZO Thin-Film Transistors Prepared by Radio-frequency Magnetron Sputtering with Varied Deposition Power |
| 2012 |
共濺鍍氧化銦鋁鋅薄膜電晶體不同退火溫度之研究 |
| 2012 |
以共濺鍍製程製作氧化銦鎵鋅薄膜電晶體特性之研究 |
| 2012 |
以共濺鍍製程製作非晶質氧化銦鎵鋅薄膜之特性研究 |
| 2012 |
Electrical and optical properties of indium-aluminum-zinc oxide films prepared by magnetron cosputtering with varying deposition powers |
| 2011 |
Effect of the Insertion n+ Layer between Source/Drain and the Channel of a-IGZO TFTs |
| 2011 |
Electrical Characteristics of a-IGZO TFTs Prepared by RF Magnetron Sputtering with Varied Oxygen Flow |
| 2011 |
Effects of Oxygen Flow on the Electrical and Optical Properties of ITO Thin Films Prepared by Radio-frequency Sputtering |
|
不同氧氣流量之射頻與直流磁控濺鍍沉積銦錫氧化物薄膜電性與材料分析 |